Wire Bonding Parameters: wedge_bond_aluminum

Semiconductor wire bonding process parameters — bond pad pitch, wire diameter, loop height, pull strength, ball shear strength, bonding temperature, ultrasonic frequency/power, bonding force, and wire mechanical properties by bond type and wire material. Covers ball bonding (Au, Cu, Pd-coated Cu), wedge bonding (Al, Au), ribbon bonding (Au and Al ribbon), and heavy-wire aluminum bonding for power modules. Minimum strength values per MIL-STD-883 Method 2011 and JEDEC JESD22-B116.

Electrical Engineeringbond_type: wedge_bond_aluminum3 rows
bond typerecord idbond pad pitch min um (um)bond temp max C (C)bond temp min C (C)bond temp substrate Cbond time ms (ms)bonding force gf (gf)loop height max um (um)loop height min um (um)notespull strength min gf (gf)pull strength typical gf (gf)ultrasonic freq kHz (kHz)ultrasonic power mW (mW)wire diameter mil (mil)wire diameter um (um)wire elongation pct (pct)wire materialwire tensile strength gf (gf)
wedge_bond_aluminumwb_al_125um2001002025,2515100600200125um Al; IGBT gate and emitter bonding; wedge bond area ~8x wire cross section; heel crack is primary failure mode30506012051251.5aluminum_1pct_si75
wedge_bond_aluminumwb_al_25um45802025,255152005025um Al(1%Si); ultrasonic wedge bonding (no heat stage); room temp bonding; crescent/stitch second bond; used in RF and MEMS; bonding temp listed is stage temp range2.5460201251.5aluminum_1pct_si4.5
wedge_bond_aluminumwb_al_50um80802025,258303007550um Al(1%Si); MEMS and analog IC; ultrasonic only (no thermosonic)71160352501.5aluminum_1pct_si14

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