Cleanroom Classification: ISO_14644-1
Cleanroom classification data including ISO 14644-1:2015 particle count limits for Classes 1-9, air change rate guidelines, pressure differentials, temperature/humidity ranges, gowning requirements, and EU GMP Annex 1 (2022) Grade A/B/C/D records
| classification standard | record id | ach max (changes/hr) | ach min (changes/hr) | ach notes | gowning description | gowning level | iso class | monitoring frequency | particles 0 1um per m3 (particles/m3) | particles 0 2um per m3 (particles/m3) | pressure differential pa min (Pa) | pressure differential pa typical (Pa) | pressure type | recovery time min (min) | rh pct max (%RH) | rh pct min (%RH) | standard | temp c max (degC) | temp c min (degC) | typical applications |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ISO_14644-1 | ISO_CLASS_1_ACH | 600 | 360 | Unidirectional HEPA/ULPA laminar flow; 100% ceiling coverage | Full bunny suit with HEPA PAPR; double gowning anteroom; tacky mat | 5 | 1 | Continuous particle monitoring; viable sampling per protocol | — | — | 15 | 20 | positive | 1 | 50 | 30 | ISO 14644-1:2015; IEST-RP-CC012.3; ASHRAE Applications 2023 Ch.19 | 22 | 20 | Semiconductor nanolithography; advanced IC fabrication below 10nm node |
| ISO_14644-1 | ISO_CLASS_1_PARTICLES | — | — | — | — | — | 1 | — | 10 | 2 | — | — | — | — | — | — | ISO 14644-1:2015 | — | — | — |
| ISO_14644-1 | ISO_CLASS_2_ACH | 540 | 300 | Unidirectional HEPA/ULPA laminar flow | Full bunny suit with HEPA PAPR; double gowning anteroom | 5 | 2 | Continuous particle monitoring | — | — | 15 | 20 | positive | 1 | 50 | 30 | ISO 14644-1:2015; IEST-RP-CC012.3; ASHRAE Applications 2023 Ch.19 | 22 | 20 | Semiconductor fab; advanced photolithography |
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